IEEE

Optimizing Plasma Etching: Integrating Precise Three-Dimensional Etching Simulation and Machine Learning for Multi-Objective Optimization

Abstract: In modern semiconductor manufacturing, optimizing plasma etching processes is key for advancing technology and achieving profitable production. In this study, we propose an efficient process ...
IEEE

Introduction to clustering unsupervised machine learning algorithms applied to power quality disturbances

Abstract: Unsupervised machine learning algorithms, such as clustering and anomaly detection, work by identifying patterns and anomalies in data without the need for labeled training data. These ...
Open Heart

Enhanced cardiovascular disease risk prediction using integrated machine learning models: a study from the UK Biobank cohort

Objective Cardiovascular diseases (CVD) remain the leading cause of mortality globally, necessitating early risk identification to improve prevention and management strategies. Traditional risk ...